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Journal Articles

Time-resolved X-ray diffraction study on surface structure and morphology during molecular beam epitaxy growth

Takahashi, Masamitsu; Yoneda, Yasuhiro; Inoue, Hirotane*; Yamamoto, Naomasa*; Mizuki, Junichiro

Journal of Crystal Growth, 251(1-4), p.51 - 55, 2003/04

 Times Cited Count:3 Percentile:22.01(Crystallography)

The reflection high energy electron diffraction (RHEED) oscillation has been widely adopted for studies on growth kinetics and dynamics in molecular beam epitaxy (MBE). Recent development in brilliant X-ray source has enabled similar experiments with X-rays, which has great advantage in a straightforward interpretation of results and in a high angular resolution. In general, the diffracted intensity from surface is proportional to the surface structure factor associated with the surface reconstruction, F, multiplied by a damping factor associated with the surface roughness, m. We show that the two factors, F and m, can be obtained separately by measuring diffuse scattering around the two-dimensional Bragg peak during growth.

Journal Articles

RHEED observation of BaTiO$$_3$$ thin films grown by MBE

Yoneda, Yasuhiro; Sakaue, Kiyoshi*; Terauchi, Hikaru*

Surface Science, 529(3), p.283 - 287, 2003/04

 Times Cited Count:8 Percentile:42.85(Chemistry, Physical)

Ferroelectric BaTiO$$_3$$ thin filmwith a thickness of 10ML were epitaxally grown on SrTiO$$_3$$ (001) substrate by very slow deposition using MBE. The investigation were carried out by two growth methods: (i) codeposition and (ii) alternate deposition. In-situ observation of RHEED confirmed that an epitaxial cube-on-cube structure was prepared. After the deposition, X-ray diffraction measurements were carried out. The 10-ML-thick BaTiO$$_3$$ films were highly ${it c}$-axis oriented single crystals with good film quality.

Journal Articles

High-quality epitaxial TiO$$_{2}$$ thin films grown on $$alpha$$-Al$$_{2}$$O$$_{3}$$ substrates by pulsed laser deposition

Shinohara, Ryuji*; Yamaki, Tetsuya; Yamamoto, Shunya; Ito, Hisayoshi; Asai, Keisuke*

Journal of Materials Science Letters, 21(12), p.967 - 969, 2002/06

 Times Cited Count:9 Percentile:36.82(Materials Science, Multidisciplinary)

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